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Proceedings Paper

Thermo-activated photoetching of PMMA in direct writing by laser beam
Author(s): S. F. Maslenitsyn; V. B. Svetovoy
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Paper Abstract

The discovery of polymer ablative etching by far-ultraviolet (UV) excimer laser pulses has given rise to a wave of publications devoted to the investigation of the etching mechanism and applications of this phenomenon. Against this background, the studies in which the action of continuous UV-light on polymers is examined are less noticeable. They include the direct photoetching under UV-lamp irradiation and the direct writing by a cw laser beam on a polymethylmetacrylate (PMMA) film and some other polymeric materials. One can expect that laser writing on the polymer film will find its application in local area processing and custom patterning. The purpose of this work is to estimate the direct writing abilities for simultaneous photochemical and thermal action of a laser beam on PMMA.

Paper Details

Date Published: 1 December 1991
PDF: 6 pages
Proc. SPIE 1440, Optical Radiation Interaction with Matter, (1 December 1991); doi: 10.1117/12.48181
Show Author Affiliations
S. F. Maslenitsyn, Institute of Microelectronics (Russia)
V. B. Svetovoy, Institute of Microelectronics (Russia)


Published in SPIE Proceedings Vol. 1440:
Optical Radiation Interaction with Matter

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