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Proceedings Paper

Development of AF/PSTM
Author(s): Shifa Wu; Jian Zhang; Yinli Li; Wei Sun; Kai Xu; Yuqi Huang; Shi Pan
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Paper Abstract

According to author's Chinese invented patent ZL96 I II 979.9 named "The method of separating image of AF/PSTM (atom force and photon scanning tunneling microscope)", the first system ofAF/PSTM has been developed. Its principle, photograph, block diagram and some images ofan examination sample have been given in this paper. There are three advantages of this system: (1) AF/PSTM can eliminate the optical false image which caused by topography of sample in PSTM; (2) The optical images and topographic image of sample are separated with this AF/PSTM; (3) From once scanning imaging two optical images (refractive index image and transmissivity image) and two AFM images (topography image and phase or grads oftopography image) can be obtained.

Paper Details

Date Published: 5 September 2002
PDF: 5 pages
Proc. SPIE 4923, Nano-Optics and Nano-Structures, (5 September 2002); doi: 10.1117/12.481728
Show Author Affiliations
Shifa Wu, Dalian Univ. of Technology (China)
Jian Zhang, Dalian Univ. of Technology (China)
Yinli Li, Dalian Univ. of Technology (China)
Wei Sun, Dalian Univ. of Technology (China)
Kai Xu, Dalian Univ. of Technology (China)
Yuqi Huang, Dalian Univ. of Technology (China)
Shi Pan, Dalian Univ. of Technology (China)


Published in SPIE Proceedings Vol. 4923:
Nano-Optics and Nano-Structures
Xing Zhu; Stephen Y. Chou; Yasuhiko Arakawa, Editor(s)

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