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Proceedings Paper

Advanced QCM controller for NASA's plume impingement contamination-II
Author(s): Russell Paul Cain; Forrest E. Lumpkin; Bliss G. Carkhuff; Scott A. Wallace; O. Manuel Uy
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Paper Abstract

Currently, no accurate models or recent data exist for modeling contamination from spacecraft thrusters to meet the stringent requirements of the International Space Station (ISS). Few flight measurements of contaminant deposition from spacecraft thrusters have been made, and no measurements have been made for angles away from the plume centerline. The Plume Impingement Contamination-II (PIC-II)1 experiment is planned to provide such measurements using quartz crystal microbalances placed into the plume of a Shuttle Orbiter RCS thruster. To this end, the Johns Hopkins University Applied Physics Laboratory (APL) has supported NASA in the development of the PIC-II experiment Flight Electronics Unit known as the Remote Arm TQCM System (RATS), which will measure the contamination in the Shuttle Obiter RCS thruster. The development was based on an ongoing effort between the APL and QCM Research to develop an inexpensive, miniature TQCM controller based on a legacy of QCM controllers developed at the APL. PIC-II will provide substantial improvements over previous systems, including higher resolution, greater flexibility, intensive housekeeping, and in-situ operational control. Details of the experiment hardware and measurement technique are given. The importance of the experiment to the ISS and the general plume contamination community is discussed.

Paper Details

Date Published: 11 September 2002
PDF: 12 pages
Proc. SPIE 4774, Optical System Contamination: Effects, Measurements, and Control VII, (11 September 2002); doi: 10.1117/12.481655
Show Author Affiliations
Russell Paul Cain, Johns Hopkins Univ. (United States)
Forrest E. Lumpkin, NASA Johnson Space Ctr. (United States)
Bliss G. Carkhuff, Johns Hopkins Univ. (United States)
Scott A. Wallace, QCM Research, Inc. (United States)
O. Manuel Uy, Johns Hopkins Univ. (United States)


Published in SPIE Proceedings Vol. 4774:
Optical System Contamination: Effects, Measurements, and Control VII
Philip T. C. Chen; O. Manuel Uy, Editor(s)

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