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Proceedings Paper

Influence on the film properties of torch inclination angle in the FHD process
Author(s): Yong-Gon Seo; Sang-Hee Shin; Oh-Duk Kwon; Byung-Moon Lee; Yong-Tak Kim; Dae-Ho Yoon; Hyung-Do Yoon; Je-Min Kim; Young-Min Im
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Paper Abstract

The refractive index and the film thickness were measured by the prism coupler, and GeO2 and P2O5 concentration were analyzed by EPMA (Electron Probe Micro Analysis) according to the torch inclination angle and the distance between torch and substrate. As the torch angle was steeper, the thickness and the GeO2 concentration were increased, and the P2O5 concentration was decreased for the angle greater than 45o.

Paper Details

Date Published: 28 August 2002
PDF: 4 pages
Proc. SPIE 4904, Optical Fiber and Planar Waveguide Technology II, (28 August 2002); doi: 10.1117/12.481246
Show Author Affiliations
Yong-Gon Seo, Korea Electronics Technology Institute (South Korea)
Sang-Hee Shin, SemiTel Co., Ltd. (South Korea)
Oh-Duk Kwon, SemiTel Co., Ltd. (South Korea)
Byung-Moon Lee, SemiTel Co., Ltd. (South Korea)
Yong-Tak Kim, Sungkyunkwan Univ. (South Korea)
Dae-Ho Yoon, Sungkyunkwan Univ. (South Korea)
Hyung-Do Yoon, Korea Electronics Technology Institute (South Korea)
Je-Min Kim, Korea Electronics Technology Institute (South Korea)
Young-Min Im, Korea Electronics Technology Institute (South Korea)


Published in SPIE Proceedings Vol. 4904:
Optical Fiber and Planar Waveguide Technology II
Shuisheng Jian; Steven Shen; Katsunari Okamoto, Editor(s)

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