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Proceedings Paper

Fabrication of silica-on-silicon waveguide devices by PECVD
Author(s): Song Fure Lin; J. P. Hou; C. H. Chiu; Jing-Yuan Lin; T. C. Chu; D. P. Tsai; A. K. Chu
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Paper Abstract

Planar lightwave circuits (PLC) utilizing glass related waveguide technologies are nowadays crucial components in optical communication system. In this paper, we present a standardized, silicon dioxide (SiO2) based waveguide structure prepared by plasma enhanced chemical vapor deposition (PECVD) for applications in telecommunication devices, such as wide-band optical power splitter. The index of waveguide layer can be controlled by the N2O:SiH4 ratio and process parameter. High density inductively coupled plasma (ICP) etching system was used to define the waveguide pattern. The fabricated waveguides show satisfactory optical characteristics including low waveguide loss, low chip-to-fiber coupling loss (< 0.5 dB/facet), and low polarization dependence loss (< 0.2 dB).

Paper Details

Date Published: 28 August 2002
PDF: 7 pages
Proc. SPIE 4904, Optical Fiber and Planar Waveguide Technology II, (28 August 2002); doi: 10.1117/12.481243
Show Author Affiliations
Song Fure Lin, Luminent Inc. (Taiwan)
J. P. Hou, Luminent Inc. (Taiwan)
C. H. Chiu, Luminent Inc. (Taiwan)
Jing-Yuan Lin, Luminent Inc. (Taiwan)
T. C. Chu, National Taiwan Univ. (Taiwan)
D. P. Tsai, National Taiwan Univ. (Taiwan)
A. K. Chu, National Sun Yat-Sen Univ. (Taiwan)


Published in SPIE Proceedings Vol. 4904:
Optical Fiber and Planar Waveguide Technology II
Shuisheng Jian; Steven Shen; Katsunari Okamoto, Editor(s)

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