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Proceedings Paper

Highly uniform and highly reliable 850-nm VCSEL platform for high-speed optical communications
Author(s): Hao Chung Kuo; Z. Q. Shi; Minh Trieu; Xuesong Dong; Ghulam Hasnain; Chih Ping Kuo; Andrew Liao
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Paper Abstract

In this paper, we report a high performance, highly uniform, and highly reliable VCSEL platform at LuxNet Corporation. The proprietary design of this VCSEL gives it oxide VCSEL-like performance and an implant VCSEL-like reliability. Threshold currents are between 1 .0 to 2.5 mA, and the slope efficiencies are between 0.3 to 0.5W/A. The threshold current change with temperature is minimal and the slope efficiency change less than ~30% when the substrate temperature is raised from 25°C to 90°C. The eye diagram of LuxNet TOSA operating at 2.5 GB/s with 6mA bias and 10dB extinction ratio shows very clean eye with jitter less than 3Ops. We have accumulated life test data up to 5000 hours at 100°C/2OmA with exceptional reliability. And the WHTOL (85/85) bias at 8mA has passed over 3000 hours. In addition, the overall yield across a 3 inch wafer is over 90%. The chips are now being shipped in commercial quantities. Finally, we will present our preliminary results of 10 Gb/s VCSEL.

Paper Details

Date Published: 29 August 2002
PDF: 6 pages
Proc. SPIE 4905, Materials and Devices for Optical and Wireless Communications, (29 August 2002); doi: 10.1117/12.481016
Show Author Affiliations
Hao Chung Kuo, LuxNet Corp. (United States)
Z. Q. Shi, LuxNet Corp. (United States)
Minh Trieu, LuxNet Corp. (United States)
Xuesong Dong, LuxNet Corp. (United States)
Ghulam Hasnain, LuxNet Corp. (United States)
Chih Ping Kuo, LuxNet Corp. (United States)
Andrew Liao, LuxNet Corp. (United States)

Published in SPIE Proceedings Vol. 4905:
Materials and Devices for Optical and Wireless Communications
Constance J. Chang-Hasnain; YuXing Xia; Kenichi Iga, Editor(s)

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