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Proceedings Paper

Fabricated technology for polymer/Si arrayed waveguide grating
Author(s): Yu Zhao; Fei Wang; Daming Zhang; Chunsheng Ma; Kaixin Chen; Shiyong Liu; Maobin Yi
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Paper Abstract

In this paper, the basic principle, details of fabricating process and measuring results were described for a polymer/Si arrayed waveguide grating (AWG) multiplexer around the central wavelength of 1.550 micron with the wavelength spacing of 1.6nm. The fluorinated polymer was used to fabricate AWG to reduce the optical loss, but the fluorinated material was expensive, so we initially adopted the polymer of polymethylmethacrylate(PMMA) type to go on technologic research. The regulated curve of refractive index was given for the core polymer. In order to obtain better shape of the waveguide after the reactive ion etching (RIE) using oxygen, an aluminum film as mask was used on polymer instead of conventional photoresist as mask. In order to reduce radiation loss of underciadding layer to Si substrate, the underciadding layer thickness was increased to 11 micron through two times of spin-coating, thus the radiation loss was reduced to the order of 0.001dB. The measuring results indicates fabricated optical waveguide achieved single-mode transmission.

Paper Details

Date Published: 29 August 2002
PDF: 4 pages
Proc. SPIE 4905, Materials and Devices for Optical and Wireless Communications, (29 August 2002); doi: 10.1117/12.480994
Show Author Affiliations
Yu Zhao, Jilin Univ. (China)
Fei Wang, Jilin Univ. (China)
Daming Zhang, Jilin Univ. (China)
Chunsheng Ma, Jilin Univ. (China)
Kaixin Chen, Jilin Univ. (China)
Shiyong Liu, Jilin Univ. (China)
Maobin Yi, Jilin Univ. (China)

Published in SPIE Proceedings Vol. 4905:
Materials and Devices for Optical and Wireless Communications
Constance J. Chang-Hasnain; YuXing Xia; Kenichi Iga, Editor(s)

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