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Deposition of Er3+:Al2O3 films by closed-field unbalanced magnetron sputtering and photoluminescence characterization of the films
Author(s): Chengren Li; Changlie Song; Shufeng Li; Wenxong Rao
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Paper Abstract

Er3+-doped A1203 thin films are deposited on silicon substrates by reactive closed-field unbalanced magnetron sputtering(CFUBMS).The process parameters,such as target bias voltage, substrate bias voltage, 02 gas flows, sputtering gas pressure,are studied.The thin film properties of interest are Al/O ratio,thickness,refractive index,crystallographic structure and surface roughness. 1.53μm photoluminescence(PL) characterization pumping at wavelength 980nm is measured.The relationship between PL peak intensity and different anneal temperature, and different pumping power is experimental investigated.

Paper Details

Date Published: 29 August 2002
PDF: 6 pages
Proc. SPIE 4905, Materials and Devices for Optical and Wireless Communications, (29 August 2002); doi: 10.1117/12.480976
Show Author Affiliations
Chengren Li, Dalian Univ. of Technology (China)
Changlie Song, Dalian Univ. of Technology (China)
Shufeng Li, Dalian Univ. of Technology (China)
Wenxong Rao, Dalian Univ. of Technology (China)

Published in SPIE Proceedings Vol. 4905:
Materials and Devices for Optical and Wireless Communications
Constance J. Chang-Hasnain; YuXing Xia; Kenichi Iga, Editor(s)

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