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Proceedings Paper

Dynamics study of multiwavelength excitation process using F2 and KrF excimer lasers
Author(s): Kotaro Obata; Koji Sugioka; Takahiro Inamura; Hiroshi Takai; Koichi Toyoda; Katsumi Midorikawa
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Paper Abstract

Ablation dynamics of fused silica by multiwavelength excitation process using F2 and KrF excimer laser has been investigated by energy analyzed mass spectrometry of ablated species. The number of Si ion generated by multiwavelength excitation process corresponds to that by single-F2 laser ablation and to approximately 2.1 times larger than that by single-KrF excimer laser ablation. In addition, kinetic energy distribution of Si+ ablated by multiwavelength excitation process shows almost same as that by single-F2 laser ablation. We regard that absorption of KrF excimer laser by excited state generated by F2 laser (excited-state absorption: ESA) causes similar electron excitation process to single-F2 laser irradiation, resulting in enhancement of Si ion with higher kinetic energy and then in high-quality ablation.

Paper Details

Date Published: 17 October 2003
PDF: 6 pages
Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); doi: 10.1117/12.479542
Show Author Affiliations
Kotaro Obata, Tokyo Univ. of Science (Japan)
Koji Sugioka, RIKEN-The Institute of Physical and Chemical Research (Japan)
Takahiro Inamura, Tokyo Denki Univ. (Japan)
Hiroshi Takai, Tokyo Denki Univ. (Japan)
Koichi Toyoda, Tokyo Univ. of Science (Japan)
Katsumi Midorikawa, RIKEN-The Institute of Physical and Chemical Research (Japan)


Published in SPIE Proceedings Vol. 4977:
Photon Processing in Microelectronics and Photonics II
Alberto Piqué; Koji Sugioka; Peter R. Herman; Jim Fieret; David B. Geohegan; Frank Träger; Kouichi Murakami; Friedrich G. Bachmann; Jan J. Dubowski; Willem Hoving; Kunihiko Washio, Editor(s)

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