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Proceedings Paper

F2-laser micropatterning of chrome-coated CaF2 for vacuum-ultraviolet masks
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Paper Abstract

Chrome-on-quartz optics serve multi-functions including high-resolution masks for UV lithography. At the next node down, F2-laser lithography demands alternate high-transparency substrates such as wide-bandgap CaF2. We present here a direct-write method of F2-laser ablation for selective removal of 110-nm thick chrome films on CaF2 and SiO2 (fused silica) substrates. Laser-processing parameters are presented for micropatterning of the chrome film with minimal damage to the underlying substrates. Damage thresholds, ablations rates, incubation processes, and surface morphology of the chrome and CaF2 are described together with methods that reduce ablation debris and collateral damage. Laser-patterned masks are tested in a 157-nm optical projection system at 30-mJ/cm2 fluence for sub-micron laser structuring of glass and other materials.

Paper Details

Date Published: 17 October 2003
PDF: 11 pages
Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); doi: 10.1117/12.479538
Show Author Affiliations
Andrew Yick, Univ. of Toronto (Canada)
Jianzhao Li, Univ. of Toronto (Canada)
Peter R. Herman, Univ. of Toronto (Canada)

Published in SPIE Proceedings Vol. 4977:
Photon Processing in Microelectronics and Photonics II
Alberto Piqué; David B. Geohegan; Friedrich G. Bachmann; Koji Sugioka; Frank Träger; Jan J. Dubowski; Peter R. Herman; Willem Hoving; Kouichi Murakami; Kunihiko Washio; Jim Fieret, Editor(s)

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