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Proceedings Paper

Surface microfabrication of silica glass by excimer laser irradiation of toluene solution
Author(s): Hiroyuki Niino; Yoshimi Yasui; Ximing Ding; Aiko Narazaki; Tadatake Sato; Yoshizo Kawaguchi; Akira Yabe
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Paper Abstract

Laser-induced backside wet etching of silica glass plates was performed by the excitation of a pure toluene solution with a ns-pulsed KrF excimer laser at 248 nm. Well-defined grid micropattern was fabricated without debris and microcrack around the etched area. To understand the etching mechanism, the formation and propagation of shockwave and bubble were monitored by time-resolved optical microscopy at the interface between the silica glass and the toluene solution after laser irradiation. Transient high-pressure as well as high-temperature generated by UV laser irradiation plays a key role in the etching process.

Paper Details

Date Published: 17 October 2003
PDF: 12 pages
Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); doi: 10.1117/12.479420
Show Author Affiliations
Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan)
Yoshimi Yasui, National Institute of Advanced Industrial Science and Technology (Japan)
Ximing Ding, National Institute of Advanced Industrial Science and Technology (Japan)
Aiko Narazaki, National Institute of Advanced Industrial Science and Technology (Japan)
Tadatake Sato, National Institute of Advanced Industrial Science and Technology (Japan)
Yoshizo Kawaguchi, National Institute of Advanced Industrial Science and Technology (Japan)
Akira Yabe, National Institute of Advanced Industrial Science and Technology (Japan)


Published in SPIE Proceedings Vol. 4977:
Photon Processing in Microelectronics and Photonics II
Alberto Piqué; Koji Sugioka; Peter R. Herman; Jim Fieret; David B. Geohegan; Frank Träger; Kouichi Murakami; Friedrich G. Bachmann; Jan J. Dubowski; Willem Hoving; Kunihiko Washio, Editor(s)

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