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Proceedings Paper

Mask CD uniformity impact during incoming quality control
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Paper Abstract

The paper presents the use of the Linewidth Bias Monitor (LBM), the critical dimension (CD) uniformity mapping option of the ARIS 2li die-to-database mask inspection system, for incoming quality control (IQC) in the wafer fab. LBM is qualified for this purposes by comparing it's quantitative results with CD measurements. Masks, provided by different commercial vendors, are evaluated based on the LBM maps obtained during mask inspection. Mean-to-target and 3-sigma values are evaluated and compared.

Paper Details

Date Published: 16 August 2002
PDF: 5 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479361
Show Author Affiliations
Ernesto Villa, STMicroelectronics (Italy)
Emanuele Baracchi, STMicroelectronics (Italy)
Anja Rosenbusch, Etec Systems, Inc. (United States)
Michael M. Har-zvi, Etec Systems, Inc. (Israel)
Gidon Gottlib, Etec Systems, Inc. (Israel)


Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

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