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Proceedings Paper

Recent progress of low-energy e-beam proximity projection lithography (LEEPL) with B-tool development
Author(s): Nobuo Shimazu; Hiroshi Nozue; Akihiro Endo; Akira Higuchi; T. Ise; Toyoharu Fukui; N. Yasumitsu; Tsutomu Miyatake; Norimiti Anazawa
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Paper Details

Date Published: 16 August 2002
PDF: 5 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479360
Show Author Affiliations
Nobuo Shimazu, LEEPL Corp. (Japan)
Hiroshi Nozue, LEPPL Corp. (Japan)
Akihiro Endo, LEEPL Corp. (Japan)
Akira Higuchi, LEEPL Corp. (Japan)
T. Ise, Tokyo Seimitsu Co., Ltd. (Japan)
Toyoharu Fukui, Tokyo Seimitsu Co., Ltd. (Japan)
N. Yasumitsu, Sumitomo Heavy Industries, Ltd. (Japan)
Tsutomu Miyatake, Sumitomo Heavy Industries, Ltd. (Japan)
Norimiti Anazawa, HOLON Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

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