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Proceedings Paper

Recent progress of low-energy e-beam proximity projection lithography (LEEPL) with B-tool development
Author(s): Nobuo Shimazu; Hiroshi Nozue; Akihiro Endo; Akira Higuchi; T. Ise; Toyoharu Fukui; N. Yasumitsu; Tsutomu Miyatake; Norimiti Anazawa
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Paper Abstract

Scniiconductor industry currently faces double-hold pains. One is the record-breaking semiconductor depression brought by the IT bubble collapse in the United States, and another is a brick wall called "Lithography Crisis" which stands in front of the technological progress. The former is that no growth of semiconductor market can be anticipated except household electric appliances because of the surplus of the optical communication infrastructure in the United States and sales reduction ofpersonai computer and cellular phone. The latter is that no cost effective solution can be found for next generation lithography, which has been searched for in a long time. Even in the semiconductor market of household electricity appliance, small or middle quantity production in multiple kinds is required to be extremely low cost. it is the new lithography called "LEEPL" (Low Energy Electron Beam Proximity Projection Lithography) that challenges to solve these cost issues. Thanks for simple tool configuration and small niask pattern area, LEEPL promises both tool and mask to be low cost.

Paper Details

Date Published: 16 August 2002
PDF: 5 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479360
Show Author Affiliations
Nobuo Shimazu, LEEPL Corp. (Japan)
Hiroshi Nozue, LEPPL Corp. (Japan)
Akihiro Endo, LEEPL Corp. (Japan)
Akira Higuchi, LEEPL Corp. (Japan)
T. Ise, Tokyo Seimitsu Co., Ltd. (Japan)
Toyoharu Fukui, Tokyo Seimitsu Co., Ltd. (Japan)
N. Yasumitsu, Sumitomo Heavy Industries, Ltd. (Japan)
Tsutomu Miyatake, Sumitomo Heavy Industries, Ltd. (Japan)
Norimiti Anazawa, HOLON Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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