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Proceedings Paper

Cleaning of low thermal expansion materials for low-defect EUVL mask substrates
Author(s): Eva Krueger-Velthusen; Falk Friemel; Lutz Aschke; Frank Lenzen
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Paper Abstract

First tests for cleaning Zerodur were accomplished. Because there are only a few cleaning methods suitable for the removal of small particles down to 50 nm we have investigated the behaviour of Zerodur in DI water and aqueous solutions.

Paper Details

Date Published: 16 August 2002
PDF: 3 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479359
Show Author Affiliations
Eva Krueger-Velthusen, Schott Lithotec AG (Germany)
Falk Friemel, Schott Lithotec AG (Germany)
Lutz Aschke, Schott Lithotec AG (Germany)
Frank Lenzen, Schott Lithotec AG (Germany)


Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

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