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Proceedings Paper

High-precision mask repair using nanomachining
Author(s): Martin Verbeek; Roy White; Marty Klos
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Paper Abstract

Nanomachining has recently been introduced as a new option for the repair of photomasks. The RAVE nm1300 system is a high precision system for subtractive removal of opaque mask defects. The first such system was installed at the Infineon Mask House in Munich, Germany. This paper presents the results of the acceptance testing. Programmed pattern defects on binary chrome on glass masks, alternating phase shifting masks and both 248nm and 193nm halftone phase shifting masks were used for these tests. Some examples of carbon patch trimming, sequential defect removing as well as repairing of 'non-removable' particles and irregularly shaped quartz bump defects demonstrate the unique capabilities of the tool.

Paper Details

Date Published: 16 August 2002
PDF: 8 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479356
Show Author Affiliations
Martin Verbeek, Infineon Technologies AG (Germany)
Roy White, RAVE LLC (United States)
Marty Klos, RAVE LLC (United States)

Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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