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Proceedings Paper

Inspection of alternating PSM reticles using UV-based 365-nm reticle inspection tool
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Paper Abstract

The paper presents results of a thorough study using the UV- based die-to-database mask inspection system ARIS100i for the inspection of alternating phase shifting masks (AAPSM) designed for KrF (248nm) technology. A specifically designed test mask was used to investigate sensitivity limitations of the i-line tool. Main focus is on phase errors, which were treated as a function of defect size, phase, and mask location.

Paper Details

Date Published: 16 August 2002
PDF: 5 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479352
Show Author Affiliations
Anja Rosenbusch, Etec Systems, Inc. (United States)
Michael M. Har-zvi, Etec Systems, Inc. (Israel)
Gidon Gottlib, Etec Systems, Inc. (Israel)


Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

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