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Proceedings Paper

Long-term performance of the DUV optical metrology tool for the 90-nm node
Author(s): Louis M. Chacon; Nicholas G. Doe; Richard D. Eandi; Patrick St. Cin
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Paper Abstract

Optical metrology tools have been used very successfully for measuring photomasks. The 90nm node presents new challenges with the requirement to measure dense features with arbitrary line and space widths. This paper presents performance of the Optical Proximity CD Algorithm on the new 244nm DUV optical metrology tool, the KMS100. Results for short and long-term precision, distortion, system error and xy-bias for isolated and dense line/space arrays are presented. The system is demonstrated to be highly linear and largely insensitive to the influence of OPE while maintaining high precision and repeatability.

Paper Details

Date Published: 16 August 2002
PDF: 10 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479347
Show Author Affiliations
Louis M. Chacon, Zygo Corp. (United States)
Nicholas G. Doe, Zygo Corp. (United States)
Richard D. Eandi, Zygo Corp. (United States)
Patrick St. Cin, Zygo Corp. (United States)


Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

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