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Proceedings Paper

Environmental monitoring system
Author(s): Gernot Goedl; Dirk Loeffelmacher; Timo Wandel; Gisbert Gralla; Andreas Greiner
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Paper Abstract

Taking the challenge of Moore's Law production of lCs crosses the lOOnm borderline for gate lengths. The feature size and the ultra large scale integration are not yet limited by physics but by the performance of the manufacturing systems. The capability of i.e. e-beam mask writers is determined to an increasing extent by environmental influences. Achieving high-level productivity measuring and analysis of these disturbances, and thereby the quality of the site, is taking on ever more significance. Taking the advantage of the monitoring data, future pattern fidelity requirements can be obtained by implementing both passive and active cancelling methods where needed. Although semiconductor production takes place in well controlled cleanrooms, data of several variables are not acquired permanently. In this paper we present within the framework of a new 50kV mask writer installation the benefit of an environmental monitoring system that is capable of observing magnetic field fluctuations and feedback its measurement results to an active magnetic cancellation. Additionally floor vibration data are acquired by this tool.

Paper Details

Date Published: 16 August 2002
PDF: 11 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479345
Show Author Affiliations
Gernot Goedl, Infineon Technologies AG (Germany)
Dirk Loeffelmacher, Infineon Technologies AG (Germany)
Timo Wandel, Infineon Technologies AG (Germany)
Gisbert Gralla, Mueller-BBM (Germany)
Andreas Greiner, Mueller-BBM (Germany)


Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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