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Proceedings Paper

Defect inspection and repair reticle (DIRRT) design for the 100-nm and sub-100-nm technology nodes
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Paper Details

Date Published: 16 August 2002
PDF: 10 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479340
Show Author Affiliations
Nishrin Kachwala, International SEMATECH (USA) and Conexant Systems Inc. (United States)
Klaus Eisner, International SEMATECH (USA) and Infineon Technologies (United States)


Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

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