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Proceedings Paper

Ion projection lithography (IPL): posters presented at the 5th Intrnational SEMATECH Next-Generation Lithography (NGL) workshop
Author(s): Rainer Kaesmaier; Hans Loeschner; Patrick W.H. de Jager; Albrecht Ehrmann; Stefan Hirscher; Karl Kragler; Reinhard Springer; Gerhard Stengl; Andreas Wolter
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Paper Details

Date Published: 16 August 2002
PDF: 5 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479338
Show Author Affiliations
Rainer Kaesmaier, Infineon Technologies AG (Germany)
Hans Loeschner, IMS Nanofabrication GmbH (Austria)
Patrick W.H. de Jager, TNO/TPD (Netherlands)
Albrecht Ehrmann, Infineon Technologies AG (Germany)
Stefan Hirscher, Infineon Technologies AG (Germany)
Karl Kragler, Infineon Technologies AG (Germany)
Reinhard Springer, Institute for Microelectronics (Germany)
Gerhard Stengl, IMS-Ion Microfabrication Systems GmbH (Austria)
Andreas Wolter, Infineon Technologies AG (Germany)


Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

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