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Proceedings Paper

Ion projection lithography (IPL): posters presented at the 5th Intrnational SEMATECH Next-Generation Lithography (NGL) workshop
Author(s): Rainer Kaesmaier; Hans Loeschner; Patrick W.H. de Jager; Albrecht Ehrmann; Stefan Hirscher; Karl Kragler; Reinhard Springer; Gerhard Stengl; Andreas Wolter
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Paper Abstract

At the 5th NGL Workshop, 28-3OAug200l , the IPL team, headed by Infineon Technologies, has presented overhead foils1 providing an overview of results as achieved with the Ion Projection Lithography Process Development Tool (PDT) which has been developed and realized by IMS-Vienna as part of the 1997-2001 European MEDEA project. Furthermore concepts for a full field (25X25mm2) ion projection stepper and it's wafer throughput potential have been presented.

Paper Details

Date Published: 16 August 2002
PDF: 5 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479338
Show Author Affiliations
Rainer Kaesmaier, Infineon Technologies AG (Germany)
Hans Loeschner, IMS Nanofabrication GmbH (Austria)
Patrick W.H. de Jager, TNO/TPD (Netherlands)
Albrecht Ehrmann, Infineon Technologies AG (Germany)
Stefan Hirscher, Infineon Technologies AG (Germany)
Karl Kragler, Infineon Technologies AG (Germany)
Reinhard Springer, Institute for Microelectronics (Germany)
Gerhard Stengl, IMS-Ion Microfabrication Systems GmbH (Austria)
Andreas Wolter, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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