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Proceedings Paper

Pattern data processing using 1-nm address grid
Author(s): Juergen Gramss; Hans Eichhorn; Michael Gehre; Bernd Schnabel; Traugott Schulmeiss; Detlef Melzer; Klaus Kunze; Ulrich Baetz
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Paper Abstract

In the past years the address grid for layout design, data preparation and exposure has been constantly reduced. Currently the ITRS Roadmap specifies 4nm Mask Design Grid for the 100nm technology node. The possibilities and challenges of pattern data processing for the new generation of Leica's Shaped Beam (SB) exposure tools, called SB350MW, are highlighted in this paper. In this context such issues like data volume, data processing time and fracture quality for the new 1nm pattern data format are discussed in detail.

Paper Details

Date Published: 16 August 2002
PDF: 10 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479333
Show Author Affiliations
Juergen Gramss, Leica Microsystems Lithography GmbH (Germany)
Hans Eichhorn, Leica Microsystems Lithography GmbH (Germany)
Michael Gehre, Leica Microsystems Lithography GmbH (Germany)
Bernd Schnabel, Leica Microsystems Lithography GmbH (Germany)
Traugott Schulmeiss, EQUIcon Software GmbH (Germany)
Detlef Melzer, EQUIcon Software GmbH (Germany)
Klaus Kunze, FhG IMS2 Inst. fuer Mikroelecktronische Schaltungen und Systeme (Germany)
Ulrich Baetz, FhG IMS2 Inst. fuer Mikroelecktronische Schaltungen und Systeme (Germany)


Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

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