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Proceedings Paper

Femtosecond laser ablation processing of x-cut LiNbO3 substrates for optical communication devices
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Paper Abstract

We have studied femtosecond laser ablation characteristics of LiNbO3 for the first time. LiNbO3 is ferroelectric material with large optical nonlinearity and Pockels effect. The femtosecond laser ablation is very useful to fabricate various optical devices including the optical modulator and the tunable optical filter for optical communication systems because the thermal damage around the irradiated area is small due to the short pulse width, and the sub-wavelength structures may be formed by the multi-photon excitation. In our experiments, the femtosecond Ti:Sapphire laser system (Energy 0.14 mJ/pulse, Wavelength 800 nm, Pulse duration 60 fs, Repetition rate 1 kHz) based on the chirped-pulse amplification (CPA) technique was used. The aperture with a diameter of 5 mm was imaged onto the LiNbO3 surface by the objective lens in the air. We observed ablation holes by the scanning electron microscope and the profilometer. We have found no damage around the holes and the clear boundary between ablated area and non-ablated area was observed. Those features are very useful for precise material processing. The bottom face of the holes was relatively flat. The etching rate was 0.93 micrometer/pulse and proportional to the number of the laser pulse. The results showed that the femtosecond laser ablation is an innovative tool for manufacturing LiNbO3-based optical devices.

Paper Details

Date Published: 17 October 2003
PDF: 8 pages
Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); doi: 10.1117/12.479245
Show Author Affiliations
Riichi Kitano, Keio Univ. (Japan)
Kazue Ozono, Keio Univ. (Japan)
Minoru Obara, Keio Univ. (Japan)
Hiroyuki Tsuda, Keio Univ. (Japan)

Published in SPIE Proceedings Vol. 4977:
Photon Processing in Microelectronics and Photonics II
Alberto Piqué; Koji Sugioka; Peter R. Herman; Jim Fieret; David B. Geohegan; Frank Träger; Kouichi Murakami; Friedrich G. Bachmann; Jan J. Dubowski; Willem Hoving; Kunihiko Washio, Editor(s)

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