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Proceedings Paper

Laser-assisted nanofabrication
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Paper Abstract

Laser assisted nanofabrication for surface nanopatterning is investigated. To overcome the limitation of light wavelength, pulsed lasers were applied to combine with atomic force microscope (AFM) and nanoparticle self-assembled mask to achieve sub-30 nm patterning on the metallic surfaces. The mechanisms of the formation of nanostructure patterns are discussed. Progress on numerical simulation and physical modeling of laser assisted nanofabrication has been demonstrated. The method of AFM tip or particle enhanced laser irradiation allows the study of field enhancement effects as well as its potential applications for nanolithography.

Paper Details

Date Published: 17 October 2003
PDF: 14 pages
Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); doi: 10.1117/12.479236
Show Author Affiliations
Ming Hui Hong, Data Storage Institute (Singapore)
Su Mei Huang, Data Storage Institute (Singapore)
Boris S. Luk'yanchuk, Data Storage Institute (Singapore)
Zeng Bo Wang, Data Storage Institute (Singapore)
Yong Feng Lu, Data Storage Institute (United States)
Tow Chong Chong, Data Storage Institute (Singapore)


Published in SPIE Proceedings Vol. 4977:
Photon Processing in Microelectronics and Photonics II
Alberto Piqué; Koji Sugioka; Peter R. Herman; Jim Fieret; David B. Geohegan; Frank Träger; Kouichi Murakami; Friedrich G. Bachmann; Jan J. Dubowski; Willem Hoving; Kunihiko Washio, Editor(s)

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