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Proceedings Paper

Ultrashort-pulse laser micromachining testbed development
Author(s): Jeff G. Thomas; J. T. Schriempf; Randy Gilmore
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Paper Abstract

Ultrashort pulse or femtosecond laser materials processing is an emerging technology that potentially can produce substantial cost savings in the manufacture of a wide variety of Navy systems. A laser micromachining testbed facility utilizing two industrial laser systems, a Ti:Sapphire laser capable of producing pulses of less than 150 femtoseconds and a frequency tripled Nd:YLF laser (351 nm, approximately 50 nsec pulsewidth) has been established at the Electro Optics Center (EOC). The testbed provides the EOC with a facility for feasibility testing of laser micromachining applications and a resource for workforce training. In addition, the testbed provides a unique capability of evaluating ultrashort [150 fs, long wavelength (775 nm)] pulses versus longer pulse, short wavelength (351 nm), high photon energy pulses for micromachining applications. Comparison of processing by the femtosecond and uv solid state laser will reveal the optimal processing for an intended application where throughput, stability and quality of the process can be assessed.

Paper Details

Date Published: 17 October 2003
PDF: 10 pages
Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); doi: 10.1117/12.479225
Show Author Affiliations
Jeff G. Thomas, The Pennsylvania State Univ. (United States)
J. T. Schriempf, The Pennsylvania State Univ. (United States)
Randy Gilmore, Extrude Hone Corp. (United States)


Published in SPIE Proceedings Vol. 4977:
Photon Processing in Microelectronics and Photonics II
Alberto Piqué; Koji Sugioka; Peter R. Herman; Jim Fieret; David B. Geohegan; Frank Träger; Kouichi Murakami; Friedrich G. Bachmann; Jan J. Dubowski; Willem Hoving; Kunihiko Washio, Editor(s)

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