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Proceedings Paper

Influence of additional rf discharge on the properties of carbon nitride thin films deposited by PLD
Author(s): Jan Lancok; Michal Novotny; Jiri Bulir; Miroslav Jelinek; Zdenik Zelinger
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Paper Abstract

Nitrogen-rich carbon nitride films were prepared by pulse laser deposition (PLD) combined with additional r.f. and hollow cathode discharges on fused silica, stainless steel and silicon substrates. The properties of combination of laser plasma with concentrated r.f. or HC discharges were studied using an optical emission spectroscopy (OES). The composition of the films was measured by WDX method. The transmission spectra and plastic microhardnes of the films were also measured.

Paper Details

Date Published: 9 August 2002
PDF: 7 pages
Proc. SPIE 4762, ALT'01 International Conference on Advanced Laser Technologies, (9 August 2002); doi: 10.1117/12.478622
Show Author Affiliations
Jan Lancok, Institute of Physics (Czech Republic)
Michal Novotny, Institute of Physics (Czech Republic)
Jiri Bulir, Institute of Physics (Czech Republic)
Miroslav Jelinek, Institute of Physics (Czech Republic)
Zdenik Zelinger, Institute of Physical Chemistry (Czech Republic)

Published in SPIE Proceedings Vol. 4762:
ALT'01 International Conference on Advanced Laser Technologies

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