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Proceedings Paper

Influence of substrate temperature on the achievement of Ti-Ni-Zr quasi-crystalline films grown by pulsed laser deposition
Author(s): V. Brien; A. Dauscher; P. Weisbecker; F. Machizaud
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Paper Abstract

Pulsed laser deposition has been used to prepare films in the Ti- Ni-Zr system. Morphology and structure of the obtained films have been studied as a function of substrate temperature being in the range 25 - 350 degree(s)C. Morphological and structural modifications have been followed by grazing incidence and (theta) -2(theta) X-ray diffraction, transmission, electron diffraction and imaging. Chemical composition has been analysed by electron probe micro- analysis. The in-depth variation of composition has been studied by secondary neutral mass spectroscopy. This study leads to the determination of the best growth temperature giving rise to the known quasicrystalline phase recently discovered in the Ti-Ni-Zr ternary system.

Paper Details

Date Published: 9 August 2002
PDF: 8 pages
Proc. SPIE 4762, ALT'01 International Conference on Advanced Laser Technologies, (9 August 2002); doi: 10.1117/12.478621
Show Author Affiliations
V. Brien, CNRS (France)
A. Dauscher, CNRS (France)
P. Weisbecker, CNRS (France)
F. Machizaud, CNRS (France)


Published in SPIE Proceedings Vol. 4762:
ALT'01 International Conference on Advanced Laser Technologies

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