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Proceedings Paper

Multicascade broadband optical parametric chirped pulse amplifier based on KD*P crystals
Author(s): Gennady I. Freidman; Nikolay Andreev; Viktor I. Bespalov; Vladimir I. Bredikhin; Vladislav N Ginzburg; Eugeny Katin; Efim A. Khazanov; Alexey I. Korytin; Vladimir V. Lozhkarev; Oleg V. Palashov; Anotoly K. Poteomkin; Alexander M. Sergeev; Ivan V. Yakovlev
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Paper Abstract

We have experimentally demonstrated the existence of super-broadband non-degenerated phase matching for a signal with a wavelength of 911 nm in KD*P crystal pumped with wavelength of 527nm. Parametric amplification coefficient of more than 107 in three cascades is achieved. This resulted in pulse energy 10mJ at the output of third cascade. It is shown that in the KD*P crystal chirped pulses of conventional femtosecond sources (a Ti:Sa laser at 911 nm and a Cr:forsterite laser at 1250 nm) can be amplified up to the level that ensures multipetawatt power after compression.

Paper Details

Date Published: 12 September 2003
PDF: 12 pages
Proc. SPIE 4972, Nonlinear Frequency Generation and Conversion: Materials, Devices, and Applications II, (12 September 2003); doi: 10.1117/12.478543
Show Author Affiliations
Gennady I. Freidman, Institute of Applied Physics (Russia)
Nikolay Andreev, Institute of Applied Physics (Russia)
Viktor I. Bespalov, Institute of Applied Physics (Russia)
Vladimir I. Bredikhin, Institute of Applied Physics (Russia)
Vladislav N Ginzburg, Institute of Applied Physics (Russia)
Eugeny Katin, Institute of Applied Physics (Russia)
Efim A. Khazanov, Institute of Applied Physics (Russia)
Alexey I. Korytin, Institute of Applied Physics (Russia)
Vladimir V. Lozhkarev, Institute of Applied Physics (Russia)
Oleg V. Palashov, Institute of Applied Physics (Russia)
Anotoly K. Poteomkin, Institute of Applied Physics (Russia)
Alexander M. Sergeev, Institute of Applied Physics (Russia)
Ivan V. Yakovlev, Institute of Applied Physics (Russia)


Published in SPIE Proceedings Vol. 4972:
Nonlinear Frequency Generation and Conversion: Materials, Devices, and Applications II
Kenneth L. Schepler; Dennis D. Lowenthal; Jeffrey W. Pierce, Editor(s)

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