Share Email Print

Proceedings Paper

High-resolution x-ray masks for high-aspect-ratio microelectromechanical systems (HARMS)
Author(s): Lin Wang; Flavio Aristone; Jost Goettert; Jong Ren Kong; Keith Bradshaw; Todd R. Christenson; Yohannes M. Desta; Yoonyoung Jin
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

X-ray lithography is commonly used to build high aspect ratio microstructures (HARMS) in a 1:1 proximity printing process. HARMS fabrication requires high energy X-rays to pattern thick resist layers; therefore the absorber thickness of the working X-ray mask needs to be 10-50 μm in order to provide high contrast. To realize high resolution working X ray masks, it is necessary to use intermediate X-ray masks which have been fabricated using e beam or laser lithographic techniques. The intermediate masks are characterized by submicron resolution critical dimensions (CD) but comparatively lower structural heights (~2 μm). This paper mainly focuses on the fabrication of high resolution X-ray intermediate masks. A three-step approach is used to build the high resolution X-ray masks. First, a so called initial mask with sub-micron absorber thickness is fabricated on a 1 μm thick silicon nitride membrane using a 50KeV e beam writer and gold electroplating. The initial X-ray mask has a gold thickness of 0.56 μm and a maximum aspect ratio of 4:1. Soft X-ray lithography and gold electroplating processes are used to copy the initial mask to form an intermediate mask with 1 μm of gold. The intermediate mask can be used to fabricate a working X-ray mask by following a similar set of procedures outlined above.

Paper Details

Date Published: 15 January 2003
PDF: 6 pages
Proc. SPIE 4979, Micromachining and Microfabrication Process Technology VIII, (15 January 2003); doi: 10.1117/12.478268
Show Author Affiliations
Lin Wang, Louisiana State Univ. (United States)
Flavio Aristone, Louisiana State Univ. (United States)
Jost Goettert, Louisiana State Univ. (United States)
Jong Ren Kong, Louisiana State Univ. (United States)
Keith Bradshaw, Univ. of Texas at Dallas (United States)
Todd R. Christenson, Sandia National Labs. (United States)
Yohannes M. Desta, Louisiana State Univ. (United States)
Yoonyoung Jin, Louisiana State Univ. (United States)

Published in SPIE Proceedings Vol. 4979:
Micromachining and Microfabrication Process Technology VIII
John A. Yasaitis; Mary Ann Perez-Maher; Jean Michel Karam, Editor(s)

© SPIE. Terms of Use
Back to Top