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Proceedings Paper

SU-8-based deep x-ray lithography/LIGA
Author(s): Linke Jian; Yohannes M. Desta; Jost Goettert; Martin Bednarzik; Bernd Loechel; Yoonyoung Jin; Georg Aigeldinger; Varshni Singh; Gisela Ahrens; Gabi Gruetzner; Ralf Ruhmann; Reinhard Degen
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Paper Abstract

Poly-methylmethacrylate (PMMA), a positive resist, is the most commonly used resist for deep X-ray lithography (DXRL)/LIGA technology. Although PMMA offers superior quality with respect to accuracy and sidewall roughness but it is also extremely insensitive. In this paper, we present our research results on SU-8 as negative resist for deep X-ray lithography. The results show that SU-8 is over two order of magnitude more sensitive to X-ray radiation than PMMA and the accuracy of the SU-8 microstructures fabricated by deep X-ray lithography is superior to UV-lithography and comparable to PMMA structures. The good pattern quality together with the high sensitivity offers rapid prototyping and direct LIGA capability. Moreover, the combinational use of UV and X-ray lithography as well as the use of positive and negative resists made it possible to fabricate complex multi-level 3D microstructures. The new process can be used to fabricate complex multi-level 3D structures for MEMS, MOEMS, Bio-MEMS or other micro-devices.

Paper Details

Date Published: 15 January 2003
PDF: 8 pages
Proc. SPIE 4979, Micromachining and Microfabrication Process Technology VIII, (15 January 2003); doi: 10.1117/12.478246
Show Author Affiliations
Linke Jian, Louisiana State Univ. (United States)
BESSY GmbH (Germany)
Yohannes M. Desta, Louisiana State Univ. (United States)
Jost Goettert, Louisiana State Univ. (United States)
Martin Bednarzik, BESSY GmbH (Germany)
Bernd Loechel, BESSY GmbH (Germany)
Yoonyoung Jin, Lousiana State Univ. (United States)
Georg Aigeldinger, Louisiana State Univ. (United States)
Varshni Singh, Louisiana State Univ. (United States)
Gisela Ahrens, micro resist technology GmbH (Germany)
Gabi Gruetzner, micro resist technology GmbH (Germany)
Ralf Ruhmann, micro resist technology GmbH (Germany)
Reinhard Degen, Micromotion GmbH (Germany)

Published in SPIE Proceedings Vol. 4979:
Micromachining and Microfabrication Process Technology VIII
John A. Yasaitis; Mary Ann Perez-Maher; Jean Michel Karam, Editor(s)

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