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Proceedings Paper

Blazed silicon grating made of (111) silicon wafer
Author(s): Hui Ju; Ping Zhang; Shurong Wang; Jingqiu Liang; Yihui Wu
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Paper Abstract

So far, the history of silicon gratings has more than 20 years and the development of fabrication methods and applications have improved a lot. Microfabrication process to made silicon gratings can be divided into bulk silicon and surface silicon technology. All these technologies are compatible with the process of MEMS, and this made it possible to fabricate micro spectrometers. We present the fabrication process of a grating by using (111) silicon wafer. The silicon gratings were manufactured using silicon micromachining techniques, as ultraviolet lithography and anisotropic wet etching, achieving good uniformity surface and grating facets of excellent optical quality. Some testing results on the silicon grating are presented.

Paper Details

Date Published: 15 January 2003
PDF: 8 pages
Proc. SPIE 4979, Micromachining and Microfabrication Process Technology VIII, (15 January 2003); doi: 10.1117/12.478239
Show Author Affiliations
Hui Ju, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Ping Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Shurong Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jingqiu Liang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Yihui Wu, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 4979:
Micromachining and Microfabrication Process Technology VIII
John A. Yasaitis; Mary Ann Perez-Maher; Jean Michel Karam, Editor(s)

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