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Proceedings Paper

Zone-plate array lithography (ZPAL): a maskless fast-turnaround system for micro-optic device fabrication
Author(s): Rajesh Menon; Dario Gil; David J. D. Carter; Amil Patel; Henry I. Smith
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Paper Abstract

Ever-increasing demands of smaller feature sizes and larger throughputs have catapulted the semicondutor lithography juggernaut to develop immensely complex and expensive systems. However, it is not clear if the lithography needs for microoptic and other “botique” device fabrication are being addressed. ZPAL is a new nanolithography technique which leverages advances in micromechanics and diffractive optics technologies. We present ZPAL as the ideal system for such non-conventional lithography needs.

Paper Details

Date Published: 17 January 2003
PDF: 8 pages
Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); doi: 10.1117/12.477856
Show Author Affiliations
Rajesh Menon, Massachusetts Institute of Technology (United States)
Dario Gil, Massachusetts Institute of Technology (United States)
David J. D. Carter, Charles Stark Draper Labs., Inc. (United States)
Amil Patel, Massachusetts Institute of Technology (United States)
Henry I. Smith, Massachusetts Institute of Technology (United States)


Published in SPIE Proceedings Vol. 4984:
Micromachining Technology for Micro-Optics and Nano-Optics
Eric G. Johnson, Editor(s)

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