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Proceedings Paper

Additive lithography for refractive micro-optics
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Paper Abstract

An innovative fabrication technique is introduced that is based on multiple exposure techniques for micro-optics fabrication. This approach is compatible with conventional lithography systems used in Integrated Circuit manufacturing and can be applied to thick and thin photoresists. The additive concept is centered on the idea of using multiple exposures to remove the desired amount of resist without resorting to multiple etching steps. This presentation will explain how the additive technique, used with thin and thick resists, will revolutionize our capability to efficiently form refractive lenses and micro-optics for optical beam shaping and transforming. The quality and reproducibility of these elements will also be discussed.

Paper Details

Date Published: 17 January 2003
PDF: 9 pages
Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); doi: 10.1117/12.477839
Show Author Affiliations
Mahesh Pitchumani, CREOL/Univ. of Central Florida (United States)
Heidi Hockel, CREOL/Univ. of Central Florida (United States)
Jeremiah Brown, CREOL/Univ. of Central Florida (United States)
Waleed S. Mohammed, CREOL/Univ. of Central Florida (United States)
Eric G. Johnson, CREOL/Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 4984:
Micromachining Technology for Micro-Optics and Nano-Optics
Eric G. Johnson, Editor(s)

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