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Proceedings Paper

Direct writing of 40-nm features inside fused silica glass with oscillator ultrafast lasers
Author(s): Sheng Wu; Zhaozhi Wan
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Paper Abstract

With ultra-fast oscillator lasers (less than 1nJ/pulse, 80MHz repetition rate), we propose that we could fabricate features with less than 40nm inside UV transparent material such as fused silica and quartz. The low threshold property of this demonstration could lower the cost of lasers, and improve the throughput of laser machining due to the quasi-CW nature of the laser used. Our initial results shows that damages are observed with threshold as low as 1nJ before the UV objective, and then size is below 1 micron.

Paper Details

Date Published: 17 January 2003
PDF: 5 pages
Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); doi: 10.1117/12.477832
Show Author Affiliations
Sheng Wu, California Institute of Technology (United States)
Zhaozhi Wan, California Institute of Technology (United States)

Published in SPIE Proceedings Vol. 4984:
Micromachining Technology for Micro-Optics and Nano-Optics
Eric G. Johnson, Editor(s)

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