Share Email Print
cover

Proceedings Paper

Overview of grey-scale photolithography for micro-optical elements fabrication
Author(s): Zheng Cui; Jinglei Du; Yongkang Guo
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The advance in microlithography has greatly helped the development of microoptical elements. Large array of microlenses can now be fabricated in the same fashion as manufacturing of integrated circuits. Because most of the microoptical elements require well-defined and continuous surface relief profile, special methods are needed to supplement to the normal microlithography to produce those relief structures. One of the techniques is greyscale lithography, including electron and laser beam direct write and greyscale photolithography. In this paper, the development of greyscale photolithography is reviewed, in comparison with the direct write techniques. The new development in coding method for greyscale mask is introduced. The importance of correcting non linearity in optical imaging and resist development is discussed. A discussing is also devoted to practical issues in mask fabrication, thick resist patterning and pattern transfer process.

Paper Details

Date Published: 17 January 2003
PDF: 7 pages
Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); doi: 10.1117/12.477831
Show Author Affiliations
Zheng Cui, Rutherford Appleton Lab. (United Kingdom)
Jinglei Du, Sichuan Univ. (China)
Yongkang Guo, Sichuan Univ. (China)


Published in SPIE Proceedings Vol. 4984:
Micromachining Technology for Micro-Optics and Nano-Optics
Eric G. Johnson, Editor(s)

© SPIE. Terms of Use
Back to Top