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Proceedings Paper

EPL data conversion system EPLON
Author(s): Kokoro Kato; Kuninori Nishizawa; Tamae Haruki; Tadao Inoue
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Paper Abstract

We have developed the EPL mask data conversion system EPLON. It provides comprehensive capabilities necessary for the data conversion of EPL masks. This paper presents the features of each function and the evaluation result of data conversion with actual data on a full chip level. The result shows that the whole data conversion is possible within reasonable time for huge data. We also propose a new format for describing EPL mask data to deal with the huge size of EPL mask data after conversion. The format is called the EPLM format and it contains one main file and multiple subfield files.

Paper Details

Date Published: 1 August 2002
PDF: 11 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.477010
Show Author Affiliations
Kokoro Kato, Seiko Instruments Inc. (Japan)
Kuninori Nishizawa, Seiko Instruments Inc. (Japan)
Tamae Haruki, Seiko Instruments Inc. (Japan)
Tadao Inoue, Seiko Instruments Inc. (Japan)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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