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Proceedings Paper

EPL mask fabrication
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Paper Abstract

The next generation lithography, either electron or photon based, will be first introduced on critical levels for device manufacture. These levels have different requirements for difficulty of meeting image size uniformity, image placement, and patterning requirements on masks. Membrane masks are needed for electron projection lithography (EPL), and the fabrication of membrane masks generates new requirements such as the need for complementary mask pairs for stencil masks. In this paper, we discuss experiments for fabricating EPL masks for device levels.

Paper Details

Date Published: 1 August 2002
PDF: 9 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.477008
Show Author Affiliations
Michael J. Lercel, IBM Microelectronics Div. (United States)
Carey T. Williams, IBM Microelectronics Div. (United States)
Mark Lawliss, IBM Microelectronics Div. (United States)
Robin Ackel, IBM Microelectronics Div. (United States)
Louis Kindt, IBM Microelectronics Div. (United States)
Emily Fisch, IBM Microelectronics Div. (United States)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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