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Proceedings Paper

Pattern printability for reflectance degradation of Mo/Si mask blanks in EUV lithography
Author(s): Minoru Sugawara; Masaaki Ito; Akira Chiba; Eiichi Hoshino; Hiromasa Yamanashi; Hiromasa Hoko; Taro Ogawa; Byoung Taek Lee; Takashi Yoneda; Masashi Takahashi; Iwao Nishiyama; Shinji Okazaki
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Paper Abstract

The effect of variations in the thickness of the multilayer of a mask blank on pattern printability was examined. The multilayer was assumed to consists of 40 Si/Mo bilayers. For a given total thickness, variations in the thicknesses of the individual SI and Mo monolayers produce such a small loss in reflectance that printability remains good for both binary and attenuated phase-shifting masks, even when such variations exist. On the other hand, variations in the total thickness shift the peak of the reflectance spectrum, which degrades the reflectance on a wafer. In this case, printability for a binary mask is determined simply by the reflectance loss on a wafer, while printability for an attenuated PSM is strongly influenced by variations in total thickness because they change the phase and attenuated reflectance.

Paper Details

Date Published: 1 August 2002
PDF: 10 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476991
Show Author Affiliations
Minoru Sugawara, Association of Super-Advanced Electronics Technologies (Japan)
Masaaki Ito, Association of Super-Advanced Electronics Technologies (Japan)
Akira Chiba, Association of Super-Advanced Electronics Technologies (Japan)
Eiichi Hoshino, Association of Super-Advanced Electronics Technologies (Japan)
Hiromasa Yamanashi, Association of Super-Advanced Electronics Technologies (Japan)
Hiromasa Hoko, Association of Super-Advanced Electronics Technologies (Japan)
Taro Ogawa, Association of Super-Advanced Electronics Technologies (Japan)
Byoung Taek Lee, Association of Super-Advanced Electronics Technologies (Japan)
Takashi Yoneda, Association of Super-Advanced Electronics Technologies (Japan)
Masashi Takahashi, Association of Super-Advanced Electronics Technologies (Japan)
Iwao Nishiyama, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Okazaki, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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