Share Email Print
cover

Proceedings Paper

Defect dispositioning using mask printability analysis on alternating phase-shifting masks
Author(s): Chung-Hsing Chang; Chen-Hao Hsieh; San-De Tzu; Chang-Min Dai; Burn Jeng Lin; Linyong Pang; Qi-De Qian; Jiunn-Hung Chen; Jason H. Huang
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In this paper, the simulation of wafer images for Alternating Aperture Phase Shift Masks is addressed by comparing wafer printing image with simulation. This is the first accuracy study for Virtual Stepper's newly developed AAPSM simulation module. The test reticle used includes 70 nm gate structures with three types of programmed phase defects: edge, corner, and center defects on rectangular shifter patterns. Wafer exposures are performed using 193 nm imaging technology and inspection images generated on a KLA-Tencor's SLF27 system. These images are used by the Virtual Stepper System to provide simulated wafer images using the specified stepper parameters. The results are compared to the simulation results from the Aerial Image Measurement System (AIMSTM) and SEM images of resist patterns.

Paper Details

Date Published: 1 August 2002
PDF: 8 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476976
Show Author Affiliations
Chung-Hsing Chang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chen-Hao Hsieh, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
San-De Tzu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chang-Min Dai, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Burn Jeng Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Linyong Pang, Numerical Technologies, Inc. (United States)
Qi-De Qian, Numerical Technologies, Inc. (United States)
Jiunn-Hung Chen, Numerical Technologies, Inc. (United States)
Jason H. Huang, Numerical Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

© SPIE. Terms of Use
Back to Top