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Proceedings Paper

Defect printability analysis on alternating phase-shifting masks
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Paper Abstract

In this paper, we demonstrate new simulation capabilities for defect dispositioning of alternating aperture phase shift masks (AAPSM). A defect mask for use in a 248 nm exposure tool was fabricated with programmed phase defects. Inspection images of the defects were taken on Lasertec's MD3000 and KLA-Tencor's SLF27 inspection systems. The simulation tool takes defect images as input and simulates photolithography performance via aerial image modeling. We present preliminary modeling results that show good agreement between simulated CDs and the CDs from Aerial Image Measurement System (AIMSTM) measurements. This work shows the potential for extending Virtual Stepper?System to AAPSMs on a variety of inspection platforms.

Paper Details

Date Published: 1 August 2002
PDF: 8 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476975
Show Author Affiliations
Linyong Pang, Numerical Technologies, Inc. (United States)
Qi-De Qian, Numerical Technologies, Inc. (United States)
Kevin K. Chan, Numerical Technologies, Inc. (United States)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Masaharu Nishiguchi, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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