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Proceedings Paper

Pellicle-induced distortions in advanced photomasks
Author(s): Minoru Fujita; Masaya Akiyama; Masahiro Kondo; Hiroaki Nakagawa; Daniel Tanzil; Florence O. Eschbach; Eric P. Cotte; Roxann L. Engelstad; Edward G. Lovell
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Paper Abstract

A comprehensive design of experiment was elaborated to evaluate the effects of frame flatness, mask adhesive compliance, and mounting load on pellicle-induced distortions for soft pellicle systems. A dynamic mechanical analyzer was used to determine the elastic modulus of the adhesives materials, and a capacitive sensor-based tool was employed to measure the pellicle frame bow prior to mounting. Registration measurements were conducted on test reticles on a 21 X 21 array of grid points, before and after pellicle attachment. Statistical analysis (Anova test) was conducted to determine if the means for each sample group were statistically discernable. Overall, the magnitude of the distortions was very low for the pellicle mounting mechanism selected. Nevertheless the results indicated that the sample group with the flexible (softer) mask adhesive material exhibited lower distortions than that with conventional (stiffer) mask adhesive. Either larger sample size and/or wider variations in initial frame bow and mounting pressure will be required to assess the impact of these parameters on pellicle-induced distortions. Flexible (softer) mask adhesives are believed to minimize photomask deformation during the mounting process, resulting in lower pellicle-induced distortions.

Paper Details

Date Published: 1 August 2002
PDF: 8 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476974
Show Author Affiliations
Minoru Fujita, Mitsui Chemicals, Inc. (Japan)
Masaya Akiyama, Mitsui Chemicals, Inc. (Japan)
Masahiro Kondo, Mitsui Chemicals, Inc. (Japan)
Hiroaki Nakagawa, Mitsui Chemicals, Inc. (Japan)
Daniel Tanzil, Intel Corp. (United States)
Florence O. Eschbach, Intel Corp. (United States)
Eric P. Cotte, Univ. of Wisconsin/Madison (United States)
Roxann L. Engelstad, Univ. of Wisconsin/Madison (United States)
Edward G. Lovell, Univ. of Wisconsin/Madison (United States)


Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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