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Proceedings Paper

Development of mask-making process for CLM manufacturing technology
Author(s): Jin-Hyung Park; Dong-Hoon Chung; Man-Ki Lee; In-Kyun Shin; Seong-Woon Choi; Hee-Sun Yoon; Jung-Min Sohn; J. Fung Chen; Douglas J. Van Den Broeke
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Paper Abstract

The extension of KrF lithography has become the major trend in semiconductor manufacturing due to the delay of ArF lithography. Therefore, various resolution enhancement techniques (RETS) are employed for sub 100nm node patterning. This paper introduces the 100 percent transmission PSM as a candidate for resolving the problems with previous approaches using a transparent phase-shift mask. CLM shows a high optical performance and relatively simple mask fabrication compare to other strong phase-shift mask. However, full-chip level CLM application is still under development due to the difficulty of mask manufacturing and lack of proper layout converting environment. In this paper, we covered mask-making process such as the quartz dry etch and defect engineering which are critical to CLM manufacturing. We made a test mask based on the basic CLM concept and evaluated its optical performance. Finally, we will show the feasibility of chrome-less mask manufacturing for real device application.

Paper Details

Date Published: 1 August 2002
PDF: 10 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476959
Show Author Affiliations
Jin-Hyung Park, Samsung Electronics Co., Ltd. (South Korea)
Dong-Hoon Chung, Samsung Electronics Co., Ltd. (South Korea)
Man-Ki Lee, Samsung Electronics Co., Ltd. (South Korea)
In-Kyun Shin, Samsung Electronics Co., Ltd. (South Korea)
Seong-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Hee-Sun Yoon, Samsung Electronics Co., Ltd. (South Korea)
Jung-Min Sohn, Samsung Electronics Co., Ltd. (South Korea)
J. Fung Chen, ASML MaskTools, Inc. (United States)
Douglas J. Van Den Broeke, ASML MaskTools, Inc. (United States)


Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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