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Proceedings Paper

Novel baking technology using halogen lamps for higher-precision photomask fabrication
Author(s): Hideaki Sakurai; Masamitsu Itoh; Noboru Fujiwara; Satoshi Yasuda; T. Ishimura; Shigeru Wakayama; Shinichi Ito
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Paper Details

Date Published: 1 August 2002
PDF: 8 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476950
Show Author Affiliations
Hideaki Sakurai, Toshiba Corp. (Japan)
Masamitsu Itoh, Toshiba Corp. (Japan)
Noboru Fujiwara, Toshiba Corp. (Japan)
Satoshi Yasuda, Toshiba Corp. (Japan)
T. Ishimura, Toshiba Corp. (Japan)
Shigeru Wakayama, Toshiba Corp. (Japan)
Shinichi Ito, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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