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Proceedings Paper

Comparative evaluation of e-beam sensitive chemically amplified resists for mask making
Author(s): Mathias Irmscher; Dirk Beyer; Joerg Butschke; Chris Constantine; Thomas Hoffmann; Corinna Koepernik; Christian Krauss; Bernd Leibold; Florian Letzkus; Dietmar Mueller; Reinhard Springer; Peter Voehringer
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Paper Abstract

Positive tone chemically amplified resists CAP209, EP012M (TOK), KRS-XE (JSR) and FEP171 (Fuji) were evaluated for mask making. The investigations were performed on an advanced tool set comprising of a Steag coater ASR5000, Steag developer ASP5000, 50kV e-beam writer Leica SB350, UNAXIS MASK ETCHER III , STS ICP silicon etcher and a CD-SEM KLA8100. We investigated and compared resolution, sensitivity, resist slope, dark field loss, CD-uniformity, line edge roughness, and etch resistance of the evaluated resists. Furthermore, the influence of post coating delay, post exposure delay and other process parameters on the resist performance was determined.

Paper Details

Date Published: 1 August 2002
PDF: 12 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476944
Show Author Affiliations
Mathias Irmscher, Institut fuer Mikroelektronik Stuttgart (Germany)
Dirk Beyer, Leica Microsystems Lithography (Germany)
Joerg Butschke, Institut fuer Mikroelektronik Stuttgart (Germany)
Chris Constantine, Unaxis USA, Inc. (United States)
Thomas Hoffmann, Institut fuer Mikroelektronik Stuttgart (Germany)
Corinna Koepernik, Institut fuer Mikroelektronik Stuttgart (Germany)
Christian Krauss, Steag Hamatech AG (Germany)
Bernd Leibold, Institut fuer Mikroelektronik Stuttgart (Germany)
Florian Letzkus, Institut fuer Mikroelektronik Stuttgart (Germany)
Dietmar Mueller, Institut fuer Mikroelektronik Stuttgart (Germany)
Reinhard Springer, Institut fuer Mikroelektronik Stuttgart (Germany)
Peter Voehringer, Institut fuer Mikroelektronik Stuttgart (Germany)


Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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