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Proceedings Paper

Design flow automation for variable-shaped beam pattern generators
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Paper Abstract

Raster scan pattern generators have been used in the photomask industry for many years. Methods and software tools for data preparation for these pattern generators are well established and have been integrated into design flows with a high degree of automation. But the growing requirements for pattern fidelity have lead to the introduction of 50 kV variable shaped beam pattern generators. Due to their different writing strategy these tools use proprietary data formats and in turn require an optimized data preparation. As a result the existing design flow has to be adopted to account for these requirements. Due to the fact that cycle times have grown severely over the last years the automation of this adopted design flow will not only enhance the design flow quality by avoiding errors during manual operations but will also help to reduce turn-around times. We developed and implemented an automated design flow for a variable shaped beam pattern generator which had to fulfill two conflicting requirements: Well established automated tools originally developed for raster scan pattern generators had to be retained with only slight modifications to avoid the (re)implementation and the concurrent usage of two systems while on the other hand data generation especially during fracturing had to be optimized for a variable shaped beam pattern generator.

Paper Details

Date Published: 1 August 2002
PDF: 8 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476937
Show Author Affiliations
Martin Bloecker, Infineon Technologies AG (Germany)
Gerd Ballhorn, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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