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Proceedings Paper

Pattern recognition in the database of a mask layout
Author(s): Shih-Ying Chen; Eric C. Lynn; Jaw-Jung Shin
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Paper Abstract

The request of pattern recognition has been frequently brought up by both mask and wafer engineers. Despite different intentions, pattern recognition is usually the first step of many applications and hence plays a major role to accomplish certain tasks. For the purpose of this work, pattern recognition is defined as searching a specific polygon or a group of particular patterns from a chip layout. Operator scan is truly not an efficient approach of pattern recognition, in particular, for cases with huge design database of advanced semiconductor integrated circuits. Obviously, an automation system of pattern recognition is necessary and benefits the data preparation process. Two categories of pattern recognition are discussed in the present study, 'fuzzy search' and 'exact match.' Each category has its own application, but the searching algorithms could be much different. Details of searching algorithms are given for both categories of pattern recognition. Due to the nature of industrial standard, the scope of the present application is limited to database with GDSII format. Hence, coordinate searching is internally used inside the searching engine.

Paper Details

Date Published: 1 August 2002
PDF: 10 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476935
Show Author Affiliations
Shih-Ying Chen, Mentor Graphics Taiwan Ltd. (Taiwan)
Eric C. Lynn, Mentor Graphics Taiwan Ltd. (Taiwan)
Jaw-Jung Shin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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