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Proceedings Paper

Integrating real-time CD corrections into a laser pattern generator
Author(s): Steven Haddleton; Lars Ivansen; Michal Simecek; Uwe Schnitker; Lars Stiblert; Manfred Enzinger; Wolfgang Roessl; Mats Sundqvist; Christian K. Kalus
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Paper Abstract

Controlling the critical dimension is central in mask manufacturing, and with the ever-shrinking design rule - and hence the increasing requirements on the mask fidelity - new and visionary ways of pushing the envelope of the critical dimension (CD), becomes essential. Research tools and off-line solutions for sizing, proximity correction and other CD compensations have been pursued for some time, but making efficient use of such technologies have been limited by ease-of-use, fracturing and computational time and data volumes associated. Here, we present techniques to deal with these challenges by taking the approach to integrate the solutions into a modern, real-time pattern generator datapath. The solution is based on hierarchical treatment of the patterns in the real-time data path of the pattern generator. By placing it in the real-time domain, we avoid the problem with exploding stream data volumes, and can exploit the parallel architecture and raw computational power of the data path engine.

Paper Details

Date Published: 1 August 2002
PDF: 10 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476922
Show Author Affiliations
Steven Haddleton, Micronic Laser Systems AB (Sweden)
Lars Ivansen, Micronic Laser Systems AB (Sweden)
Michal Simecek, SIGMA-C GmbH (Germany)
Uwe Schnitker, SIGMA-C GmbH (Germany)
Lars Stiblert, Micronic Laser Systems AB (Sweden)
Manfred Enzinger, SIGMA-C GmbH (Germany)
Wolfgang Roessl, SIGMA-C GmbH (Germany)
Mats Sundqvist, Micronic Laser Systems AB (Sweden)
Christian K. Kalus, SIGMA-C GmbH (Germany)


Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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