Share Email Print
cover

Proceedings Paper

Integrating real-time CD corrections into a laser pattern generator
Author(s): Steven Haddleton; Lars Ivansen; Michal Simecek; Uwe Schnitker; Lars Stiblert; Manfred Enzinger; Wolfgang Roessl; Mats Sundqvist; Christian K. Kalus
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Controlling the critical dimension is central in mask manufacturing, and with the ever-shrinking design rule - and hence the increasing requirements on the mask fidelity - new and visionary ways of pushing the envelope of the critical dimension (CD), becomes essential. Research tools and off-line solutions for sizing, proximity correction and other CD compensations have been pursued for some time, but making efficient use of such technologies have been limited by ease-of-use, fracturing and computational time and data volumes associated. Here, we present techniques to deal with these challenges by taking the approach to integrate the solutions into a modern, real-time pattern generator datapath. The solution is based on hierarchical treatment of the patterns in the real-time data path of the pattern generator. By placing it in the real-time domain, we avoid the problem with exploding stream data volumes, and can exploit the parallel architecture and raw computational power of the data path engine.

Paper Details

Date Published: 1 August 2002
PDF: 10 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476922
Show Author Affiliations
Steven Haddleton, Micronic Laser Systems AB (Sweden)
Lars Ivansen, Micronic Laser Systems AB (Sweden)
Michal Simecek, SIGMA-C GmbH (Germany)
Uwe Schnitker, SIGMA-C GmbH (Germany)
Lars Stiblert, Micronic Laser Systems AB (Sweden)
Manfred Enzinger, SIGMA-C GmbH (Germany)
Wolfgang Roessl, SIGMA-C GmbH (Germany)
Mats Sundqvist, Micronic Laser Systems AB (Sweden)
Christian K. Kalus, SIGMA-C GmbH (Germany)


Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

© SPIE. Terms of Use
Back to Top