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Proceedings Paper

Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques
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Paper Abstract

This paper discusses the challenges to alternating phase shift mask defect inspection and new approaches for phase defect detection using multiple illumination methods in conjunction with defect detection algorithm modifications. Die-to-die inspection algorithms were developed for the KLA-Tencor 365UV-HR (APS algorithm) and TeraStar SLF27 (TeraPhase algorithm) inspection systems based upon the use of simultaneous transmitted and reflected light signals. The development of an AltPSM programmed test vehicle is described and defect sensitivity characterization results from programmed phase defect reticles are presented. A comparison of the two approaches used for the different inspection systems is discussed. A comparison of TeraPhase to transmitted light only results from a programmed phase defect test mask shows improved phase defect detection results.

Paper Details

Date Published: 1 August 2002
PDF: 6 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476919
Show Author Affiliations
Larry S. Zurbrick, KLA-Tencor Corp. (United States)
Jan P. Heumann, Infineon Technologies AG (Germany)
Maciej W. Rudzinski, KLA-Tencor Corp. (United States)
Stanley E. Stokowski, KLA-Tencor Corp. (United States)
Jan-Peter Urbach, Infineon Technologies AG (Germany)
Lantian Wang, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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