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Proceedings Paper

New energy flux method for inspection of contact layer reticles
Author(s): William Waters Volk; Hector I. Garcia; Charika Becker; George Chen; Sterling G. Watson
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Paper Abstract

With growing implementation of low k1 lithography on DUV scanners for wafer production, detecting and analyzing photomask critical dimension (CD) errors and semitransparent defects is vital for qualifying photomasks to enable high IC wafer yields for 130nm and 100nm nodes. Using the TeraStarTM pattern inspection system's image computer platform, a new algorithm, TeraFluxTM, has been implemented and tested for the inspection of small 'closed' features. The current algorithm is run in die-to-die mode and compares the energy flux differences on features between die for small closed features, such as, contacts, trenches, and cells on chrome and half-tone reticles. Tests show the new algorithm provides CD error detection to 5 percent energy flux variation with low false defect counts. The dispositioning of very small CD errors typically requires the precision and resolution of a CD-SEM. A new capability has been developed for review of very small CD errors for this application, which displays the energy flux difference between any corresponding closed features on different die. We have characterized the sensitivity and false defect performance of the new energy flux algorithm with production masks and programmed defect test masks. The program defect test mask contains two sets of contacts at 600nm and 800nm design sizes. At each design size there are six defect types in both dense and sparse geometry. The programmed defects are designed to have 1 percent energy increments for defect sizes from 1 percent to 10 percent, and 2 percent energy increments from 10 percent to 30 percent. A sampling of inspection results will be presented. SEM measurements were taken at programmed defect locations to develop a correlation between the energy flux difference and the measured CD.

Paper Details

Date Published: 1 August 2002
PDF: 12 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476918
Show Author Affiliations
William Waters Volk, KLA-Tencor Corp. (United States)
Hector I. Garcia, KLA-Tencor Corp. (United States)
Charika Becker, KLA-Tencor Corp. (United States)
George Chen, KLA-Tencor Corp. (United States)
Sterling G. Watson, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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