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Proceedings Paper

Diffractive optical elements obtained using electron-beam writer and reactive ion etching
Author(s): Andrzej Kowalik; Zbigniew Jaroszewicz; Krzysztof Gora
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Paper Abstract

Among various kinds of micro-optical elements, diffractive optical elements are especially attractive because of their functional flexibility in handling wave-front conversion, and because of their planar, compact and lightweight nature what makes them suitable for using in wide range of research, industrial and commercial applications. We present a method of fabricating 8-level DOEs with submicrometer feature sizes in a 3-step lithographic process. In each step a variable-shaped c-beam exposure system is used for writing the pattern that is transferred into substrate by reactive ion etching to form the phase profile. Using this technology several DOEs, including rectangular-apertured micro-Fresnel lens arrays and diffraction gratings were realized on quartz and GaAs wafers. The diffraction efficiencies of these elements were measured to be up to 92%. The lens arrays showed uniform focusing characteristics, and each lens exhibited a good quality of the focused wave front.

Paper Details

Date Published: 22 July 2002
PDF: 7 pages
Proc. SPIE 4887, Optical Techniques for Environmental Sensing, Workplace Safety, and Health Monitoring, (22 July 2002); doi: 10.1117/12.475983
Show Author Affiliations
Andrzej Kowalik, Institute of Electronics Materials Technology (Poland)
Zbigniew Jaroszewicz, Institute of Applied Optics (Poland)
Krzysztof Gora, Institute of Electronics Materials Technology (Poland)


Published in SPIE Proceedings Vol. 4887:
Optical Techniques for Environmental Sensing, Workplace Safety, and Health Monitoring

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