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Proceedings Paper

Adoption costs and hierarchy efficiency for 100 nm and beyond
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Paper Abstract

As new resolution enhancement techniques (RETs) are adopted to progress beyond 100 nm, the costs and benefits to the overall system of data handling must be viewed as an overall system. A 'state' approach to viewing flows has been very useful for determining insertion points for several RETs. We examine insertion for OPC, MPC, and dipole illumination. Future improvements in data volume can come from two sources - data compression schemes, and hierarchy injection methods. Data compression gives a very rapid, one-time relief of 80 percent or more for flat data volume problems, but this gain only occurs once. Recognition of redundant cells and patterns in the layout and injecting hierarchy that eliminates this redundancy is an approach that rarely gives such large one-time gains, but can be applied over and over for many generations. We conclude with a creative suggestion for data management that aids data volume transmission problems while suggesting a new approach to the management of hierarchy.

Paper Details

Date Published: 12 July 2002
PDF: 12 pages
Proc. SPIE 4692, Design, Process Integration, and Characterization for Microelectronics, (12 July 2002); doi: 10.1117/12.475691
Show Author Affiliations
Franklin M. Schellenberg, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 4692:
Design, Process Integration, and Characterization for Microelectronics
Alexander Starikov; Kenneth W. Tobin; Alexander Starikov, Editor(s)

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